Chemical resistance of AFM 34
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Medium
Resistance
salicylic acid,aqueous solution (every concentr. 150°C )
sea water ( 200°C )
sebacic acid ( 100% 200°C )
sebacic acid ester ( 100% 200°C )
selenates (every concentr. 200°C )
selenoxy chloride ( 100% 50°C )
silane A 187 ( 100% 150°C )
silicofluoro hydrogen acid (every concentr. 50°C )
silicon tetrachloride, dry ( 100% 100°C )
silicone oil ( 100% 250°C )
silver salts, aqueous solution (every concentr. 200°C )
silver salts, strongly acid or oxidizing (every concentr. 50°C ) -
SO2, dry ( 100% 250°C )
SO2, humid (every concentr. 200°C )
SO3 ( 100% 20°C )
SO3 ( 100% 50°C )
soap solution (every concentr. 200°C )
soda, aqueous solution (every concentr. 150°C )
sodium aluminate lye (every concentr. 100°C )
sodium dichromate, strongly acid solution (every concentr. 50°C ) -
sodium hypochlorite b ( < 5% 100°C )
sodium hypochlorite b ( 5-10% 50°C )
sodium hypochlorite b ( 10-20% 50°C )
sodium hypochlorite b ( >20% 50°C )
sodium methylate (every concentr. 50°C )
sodium salts, aqueous solution (every concentr. 200°C )
sodium salts, strongly oxidizing or acid (every concentr. 50°C ) -
Solvesso ( 100% 150°C )
soybean oil ( 100% 200°C )
spindle oils ( 100% 250°C )
spirit of wine ( 100% 150°C )
starch solution (every concentr. 200°C )
steam d ( 100% 200°C )
steam, saturated d ( 100% 200°C )
stearic acid ( 100% 200°C )
stearyl alcohol ( 100% 200°C )
styrene ( 100% 100°C )
succinic acid ester ( 100% 200°C )
sugar solution (every concentr. 200°C )
sulphanilic acid ( 100% 150°C )
sulphur chloride ( 100% 50°C )
sulphur dioxide, humid (every concentr. 200°C )
sulphur dioxide,dry ( 100% 250°C )
sulphur hexafluoride ( 100% 250°C )
sulphur trioxide ( 100% 20°C )
sulphur trioxide ( 100% 50°C )
sulphur, solid ( 100% 100°C )
sulphuric acid ( 5% 100°C )
sulphuric acid ( 25% 20°C )
sulphuric acid ( 25% 80°C )
sulphuric acid ( 96% 20°C )
sulphuric acid ( 96% 50°C )
sulphurous acid (every concentr. 100°C )
sulphuryl chloride ( 100% 50°C )
synthetic resin dispersion, aqueous (every concentr. 200°C )
b Free chlorine
d in stationary processes; minimum mounting surface pressure 50 N/mm²; details on request